| 000 | 00754nam a2200253 a 4500 | ||
|---|---|---|---|
| 001 | 68749 | ||
| 003 | BD-RjUL | ||
| 005 | 20211209081815.0 | ||
| 008 | 170405s1958 nyua b 001 0 eng d | ||
| 035 | _a(BD-RjUL)68960 | ||
| 035 | _a(OCoLC)8391874 | ||
| 040 |
_aDLC _cCU-S _dOCoLC _dDLC _beng |
||
| 041 | _aeng | ||
| 082 |
_223 _a671.735 _bHOV 1958 |
||
| 100 | 1 |
_aHolland, L. _9203750 |
|
| 245 | 1 | 0 |
_aVacuum deposition of thin films / _cL. Holland [and] with a foreword by S. Tolansky. |
| 260 |
_aNew York : _bJohn Wiley & Sons, _c1958. |
||
| 300 |
_axix, 541 p. : _bill. ; _c23 cm. |
||
| 504 | _aIncludes bibliographies and indexes. | ||
| 650 | 0 |
_aVapor plating. _9203751 |
|
| 700 |
_aTolansky, S. _9159148 |
||
| 942 |
_2ddc _cBK |
||
| 999 |
_c68749 _d68749 |
||